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Fundamentals of Material Processing II. Instructor: Prof. Shashank Shekhar and Prof. Anshu Gaur, Department of Materials Science and Engineering, IIT Kanpur.

FREE
This course includes
Hours of videos

1111 years

Units & Quizzes

40

Unlimited Lifetime access
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Certificate of Completion

The aim of the course is to acquaint students with the fundamentals involved in the processing of materials. Various materials processes are used in variety of industries to create and form materials for wide range of applications. There are some commonalities behind all these processes and the aim of this course is to go through these fundamental physics and materials science behind these processes so as to be able to understand, design and predict the outcome of these methods. At the end of this course, students should be able to answer the following questions: (a) What are the various fundamental material processing techniques and the science behind it; (b) What processing method to use for a given material and a given application. This course is offered in two parts of 20 hours each. First part of the course deals with Solidification and Powder Metallurgy, while the second part deals with Metal processing and Thin film deposition. (from nptel.ac.in)

Course Currilcum

    • Lecture 01 – Introduction to Metal Working Unlimited
    • Lecture 02 – Continuum Mechanics Unlimited
    • Lecture 03 – Stress Invariants Unlimited
    • Lecture 04 – Strain Tensors and Mohr Circle for Strains Unlimited
    • Lecture 05 – Yield Stress Criterion Unlimited
    • Lecture 06 – Effective Stress and Strain Unlimited
    • Lecture 07 – Work Hardening and Flow Behaviour Unlimited
    • Lecture 08 – Effect of Strain Rate Unlimited
    • Lecture 09 – Combined Effect of Strain, Strain Rate and Temperature Unlimited
    • Lecture 10 – Effect of Temperature Unlimited
    • Lecture 11 – Cold, Warm and Hot Working Unlimited
    • Lecture 12 – Mechanics of Metal Working Unlimited
    • Lecture 13 – Wire Drawing Unlimited
    • Lecture 14 – Wire Drawing (cont.) Unlimited
    • Lecture 15 – Hodographs Unlimited
    • Lecture 16 – Upper-Bound Analysis Unlimited
    • Lecture 17 – Plane Strain Indentation Unlimited
    • Lecture 18 – Strain Calculation Models and Friction Unlimited
    • Lecture 19 – Types of Friction Unlimited
    • Lecture 20 – Effect of Friction in Rolling Unlimited
    • Lecture 21 – Introduction to Vacuum Technology Unlimited
    • Lecture 22 – Vacuum Technology Unlimited
    • Lecture 23 – Thermal Evaporation Unlimited
    • Lecture 24 – Thermal Evaporation (cont.) Unlimited
    • Lecture 25 – Electron-Beam Evaporation, Large Area Evaporation, Pulsed Laser Deposition Unlimited
    • Lecture 26 – Plasma Physics Unlimited
    • Lecture 27 – Plasma Physics (cont.) Unlimited
    • Lecture 28 – Sputtering Unlimited
    • Lecture 29 – Sputtering (cont.) Unlimited
    • Lecture 30 – Sputtering (cont.) Unlimited
    • Lecture 31 – Chemical Vapor Deposition I Unlimited
    • Lecture 32 – Chemical Vapor Deposition II Unlimited
    • Lecture 33 – Chemical Vapor Deposition III Unlimited
    • Lecture 34 – Chemical Vapor Deposition IV Unlimited
    • Lecture 35 – Epitaxy, Molecular Beam Epitaxy and Atomic Layer Deposition Unlimited
    • Lecture 36 – Adsorption and Nucleation Unlimited
    • Lecture 37 – Thin Film Growth Unlimited
    • Lecture 38 – Kinetics of Thin Film Growth Unlimited
    • Lecture 39 – Thin Film Morphology – Zone Structure Model Unlimited
    • Lecture 40 – Thin Film Characterization Unlimited