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Description
Fabrication of Silicon VLSI Circuits using the MOS Technology. Instructor: Prof. A N Chandorkar, Department of Electrical Engineering, IIT Bombay.
This course covers topics in VLSI circuit fabrication and surface micromachining technology - crystal growth; clean rooms; solid state diffusion modeling and technology; ion implantation modeling, technology and damage annealing, characterization of impurity profiles; oxidation: kinetics of silicon dioxide growth for thick, thin and ultrathin films; oxidation technologies in VLSI and ULSI, characterization of oxide films, high k and low k dielectrics for ULSI; lithography: photolithography, E-beam lithography and newer lithography techniques for VLSI/ULSI mask generation; chemical vapour deposition techniques: CVD techniques for deposition of polysilicon, silicon dioxide, silicon nitride and metal films, epitaxial growth of silicon, modeling and technology; metal film deposition: evaporation and sputtering techniques; failure mechanisms in metal interconnects, multilevel metalization schemes; plasma and rapid thermal processing: PECVD, plasma etching and RIE techniques, RTP techniques for annealing, growth and deposition of various films for use in ULSI. (from nptel.ac.in)
Course Curriculum
- Lecture 01 – Introduction: Micro to Nano – A Journey into Integrated Circuit Technology Unlimited
- Lecture 02 – Introduction: Micro to Nano – A Journey into Integrated Circuit Technology (cont.) Unlimited
- Lecture 03 – Crystal Properties and Silicon Growth Unlimited
- Lecture 04 – Crystal Properties and Silicon Growth (cont.) Unlimited
- Lecture 05 – IC Fab Labs and Fabrication of IC Unlimited
- Lecture 06 – Diffusion Unlimited
- Lecture 07 – Diffusion (cont.) Unlimited
- Lecture 08 – Solid State Diffusion Unlimited
- Lecture 09 – Solid State Diffusion (cont.) Unlimited
- Lecture 10 – Solid State Diffusion (cont.) Unlimited
- Lecture 11 – Thermal Oxidation of Silicons 1 Unlimited
- Lecture 12 – Thermal Oxidation of Silicons 2 Unlimited
- Lecture 13 – Thermal Oxidation of Silicons 3 Unlimited
- Lecture 14 – Thermal Oxidation of Silicons 4 Unlimited
- Lecture 15 – Thermal Oxidation of Silicons 5 Unlimited
- Lecture 16 – Lithography Unlimited
- Lecture 17 – Lithography (cont.) Unlimited
- Lecture 18 – Lithography (cont.) Unlimited
- Lecture 19 – Ion Implantation Unlimited
- Lecture 20 – Ion Implantation Unlimited
- Lecture 21 – Ion Implantation and Silicon IC Processing Flow for CMOS Technology Unlimited
- Lecture 22 – Ion Implantation and Silicon IC Processing Flow for CMOS Technology (cont.) Unlimited
- Lecture 23 – Silicon IC Processing Flow for CMOS Technology (cont.) Unlimited
- Lecture 24 – Thin Film Deposition Unlimited
- Lecture 25 – Thin Film Deposition (cont.) Unlimited
- Lecture 26 – Thin Film Deposition (cont.) Unlimited
- Lecture 27 – Thin Film Deposition and Etching in VLSI Processing Unlimited
- Lecture 28 – Etching in VLSI Processing and Backend Technology Unlimited
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