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Fundamentals of Micro and Nanofabrication. Instructors: Prof. Sushobhan Avasti and Prof. Shankar Selvaraja, Centre for Nano Science and Engineering, IISc Bangalore.
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Description
The course provides an in-depth understanding of top-down device fabrication. Focus is the unit processes typically used in micro and nanofabrication of devices. Both concepts and practical aspects are covered. Topics include crystal growth, doping, chemical vapor deposition, physical vapor deposition, photolithography, wet etching, dry etching, and packaging. The course is accessible to students from diverse backgrounds, such as materials, physics, chemistry, mechanical engineering, and electrical engineering. (from nptel.ac.in)
Course content
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- Lecture 01 – Introduction Unlimited
- Lecture 02 – Substrate Unlimited
- Lecture 03 – Substrate (cont.) Unlimited
- Lecture 04 – Introduction to Clean Room Unlimited
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- Lecture 05 – Contamination and Surface Cleaning Unlimited
- Lecture 06 – Advanced Cleaning Techniques Unlimited
- Lecture 07 – Defects Unlimited
- Lecture 08 – Diffusion Unlimited
- Lecture 09 – Diffusion (Advanced Concepts) Unlimited
- Lecture 10 – Ion Implantation Unlimited
- Lecture 11 – Ion Implantation (cont.) Unlimited
- Lecture 12 – Native Films Unlimited
- Lecture 13 – Native Films (Advanced Concepts) Unlimited
- Lecture 14 – Native Films: Defects at Si/SiO2 Interface Unlimited
- Lecture 21 – Atomic Layer Deposition Unlimited
- Lecture 22 – Atomic Layer Deposition (cont.) Unlimited
- Lecture 23 – Physical Vapor Deposition: Basics Unlimited
- Lecture 24 – Physical Vapor Deposition: Evaporation Unlimited
- Lecture 25 – Physical Vapor Deposition: Sputtering Unlimited
- Lecture 31 – Optical Lithography: Contact and Proximity Printing Unlimited
- Lecture 32 – Optical Lithography: Stepper and Scanner Unlimited
- Lecture 33 – Projection Lithography: Image Formation Basics Unlimited
- Lecture 34 – Projection Lithography: Image Formation in Photoresist Unlimited
- Lecture 35 – Optical Lithography: Surface Reflection Unlimited
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